Extreme Ultraviolet Lithography (EUVL) Equipment Market

Extreme Ultraviolet Lithography (EUVL) Equipment Market Outline Analysis:

The extreme ultraviolet lithography equipment market is projected to reach USD 1.96 billion and will grow at a CAGR of 9.3% by 2022. The market is all set to contribute its shares during the forecast period. The Extreme ultraviolet lithography equipment uses 13.5nm extreme ultraviolet wavelength, which is basically next generation lithography technology and expected to follow by 2020. This equipment is highly reflective as they are comprised of multilayer mirrors.

Demand Driving Factors:

The increasing demand of lithography in manufacturing of semiconductor wafers is a key driving factor for the market growth. The growing prevalence of low energy consumption devices across the world is also setting the demand of the market.

However, the lack of sufficient knowledge in the utilization of the equipment is straightly hampering the growth of the market. The cost and technical risk factors are remained as a challenging factor for the developers in the market.

The increasing demand of smart phones and other electronic goods with superior integrated circuits developing with semiconductor wafers through Nano meters wavelength is merely surging opportunities for the market growth. The shifting trend towards light weight gadgets with very less energy consumption and efficient quality is also a chance for the market to grow eventually in the near future.

Extreme Ultraviolet Lithography (EUVL) Equipment Market Segment Analysis:

Based on the light source, the extreme ultraviolet lithography equipment market is segmented into laser produced plasmas (LPP), vacuum sparks and gas discharges. From the past years, it is witnessed that the LPP segment is dominating with the highest shares and expected the same in the foreseen years.

By equipment, the market segments are mirrors, mask and light source among others. The light source and mirrors are the leading segments in the market.

Integrated device manufacturers, memory and foundry are the end users in the extreme ultraviolet lithography equipment market. Every segment has prominent role in demanding the market shares in accordance with its varied applications respectively.

Extreme Ultraviolet Lithography (EUVL) Equipment Market Regional Analysis:

Asia Pacific is anticipated to lead with the highest revenue shares of the market owing to the increasing population and growing demand of electronic devices particularly smart phones. North America stands second in leading the market shares. With the adoption of advanced technologies in electronics and electrical industries, the market growth is fueled in this region.

Key Players Covered in this Extreme Ultraviolet Lithography (EUVL) Equipment Market Report are:

• ASML
• Canon Inc.
• Intel Corporation
• Nikon Corporation
• NuFlare Technology Inc.
• Samsung Corporation
• SUSS Microtec AG
• Taiwan Semiconductor Manufacturing Company Limited (TSMC)
• Ultratech Inc.
• Vistec Semiconductor Systems

This research report includes following segmentation for the Extreme Ultraviolet Lithography (EUVL) Equipment Market size and forecast until 2022.

By Light Source

• Laser Produced Plasmas (LPP)
• Vacuum Sparks
• Gas Discharges

By Equipment

• Light Source
• Mirrors
• Mask
• Others

By Application

• Memory
• IDM
• Foundry
• Others

Extreme Ultraviolet Lithography (EUVL) Equipment Market Analysis by Regions:

• North America
• Asia-Pacific
• Europe
• Central & South America
• Middle East & Africa